- Travel range:
- X,Y – 250 µm
- Yaw – 250 µrad
- High-vacuum compatible (10-⁷ Torr)
- Operational temperatures up to 50 °C
- 350 mm aperture
- Load capacity: >10 kg
- Materials: aluminum (body), stainless steel and titanium in construction
- Weight: 31.5 kg
- Size: 600 x 600 x 60 mm
- Stability: <1.5 nm (rms) over 60 seconds
NPS-XYP-250Q 300 mm Wafer-Mask Alignment Stage
The NPS-XYP-250Q nanopositioning stage provides high-precision and highly stable positioning of wafer-masks in the 300 mm manufacturing process.
It provides 250 µm of motion in the X, Y axis and 250 µrad rotation in Yaw (φ / θz). The stage has an extremely large 350 mm aperture and load capacity of >10 kg.
High-vacuum and elevated temperature capabilities make it suitable for a broad range of mask tasks both in photomask production and wafer manufacturing including vapor deposition systems.
NPS-XYP-250Q 300 mm Wafer-Mask Alignment Stage
The NPS-XYP-250Q nanopositioning stage provides high-precision and highly stable positioning of wafer-masks in the 300 mm manufacturing process.
It provides 250 µm of motion in the X, Y axis and 250 µrad rotation in Yaw (φ / θz). The stage has an extremely large 350 mm aperture and load capacity of >10 kg.
High-vacuum and elevated temperature capabilities make it suitable for a broad range of mask tasks both in photomask production and wafer manufacturing including vapor deposition systems.
